【獲證專利公告】恭賀! 化學系陳軍互教授及團隊之研究成果「用來製造金屬化合物薄膜的噴墨系統」獲得中華民國新型專利
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發明人 |
陳軍互教授 |
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系所 |
化學系 |
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專利名稱 |
用來製造金屬化合物薄膜的噴墨系統 INK-JET SYSTEM FOR PREPARING METAL COMPOUND THIN FILM |
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證書號 |
M652269 |
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公告日期 |
113年3月1日 |
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專利摘要 |
本新型提供一種用來製造金屬化合物薄膜的噴墨系統。噴墨系統包含主體；設置在主體後側的承載座，其中承載座係配置以容置基板；以及設置在主體之側邊並位於承載座前側的複數個噴墨組件，其中噴墨組件之每一者包含噴頭以及與噴頭連通之溶液容置元件。藉由此噴墨系統，以簡化金屬化合物薄膜的製程，且可輕易完成圖案化薄膜，並有效節省溶液的用量。 An ink-jet system for preparing a metal compound thin film is provided. The ink-jet system includes a main body; a supporting base disposed at backside of the main body, in which the supporting base is configured to accommodate a substrate; and plural ink-jet components disposed at side of the main body and located at front side of the supporting base, in which each of the ink-jet components includes a nozzle and a solution-accommodating component connected to the nozzle. Process of preparing the metal compound thin film can be simplified by using the ink-jet system. Moreover, patterning the thin film can be easily achieved, and amount of solution can be effectively saved. |
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技轉服務窗口 |
卓妤芸小姐 Email：chosml@mail.nsysu.edu.tw(分機2627) 施宇翔先生Email：seanshih@mail.nsysu.edu.tw(分機2625) |
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