【獲證專利公告】恭賀! 光電系洪勇智教授及團隊之研究成果「平坦化干涉微影裝置」獲得美國發明專利!
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發明人 |
洪勇智副教授 |
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系所 |
光電系 |
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專利名稱 |
平坦化干涉微影裝置 |
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證書號 |
US10,042,173B2 |
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公告日期 |
107年8月7日 |
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專利摘要 |
A laser interference lithography system with flat-top intensity profile comprises a laser source for emitting a coherent laser beam, a first beam expander for adjusting the coherent laser beam size, a refractive beam shaper for converting a Gaussian intensity profile inherent to the coherent laser beam into a flat-top one and outputting a first collimated laser beam, a second beam expander for receiving the first collimated laser beam and outputting a second collimated laser beam, a sample holder for holding a substrate, and at least one reflector for reflecting the second collimated laser beam to generate a third collimated laser beam. The second and third collimated laser beams are transmitted to the substrate at a predetermined angle to create an interference pattern exposed onto the substrate.
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技轉服務窗口 |
莊淨智(分機2625) |
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